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Calorimetry of hydrogen desorption from ɑ-Si nanoparticles

The process of hydrogen desorption from amorphous silicon (ɑ-Si) nanoparticles grown by plasmaenhanced chemical vapor deposition (PECVD) has been analyzed by differential scanning calorimetry (DSC), mass spectrometry, and infrared spectroscopy, with the aim of quantifying the energy exchanged. Two exothermic peaks centered at 330 and 410 °C have been detected with energies per H atom of about 50 meV. This value has been compared with the results of theoretical calculations and is found to agree with the dissociation energy of Si-H groups of about 3.25 eV per H atom, provided that the formation energy per dangling bond in ɑ-Si is about 1.15 eV. It is shown that this result is valid for ɑ-Si:H films, too

© Physical Review B, 2002, vol. 65, num. 11, p. 115403-115407

American Physical Society

Author: Farjas Silva, Jordi
Das, Debabrata
Fort, Joaquim
Roura Grabulosa, Pere
Bertrán Serra, Enric
Date: 2002
Abstract: The process of hydrogen desorption from amorphous silicon (ɑ-Si) nanoparticles grown by plasmaenhanced chemical vapor deposition (PECVD) has been analyzed by differential scanning calorimetry (DSC), mass spectrometry, and infrared spectroscopy, with the aim of quantifying the energy exchanged. Two exothermic peaks centered at 330 and 410 °C have been detected with energies per H atom of about 50 meV. This value has been compared with the results of theoretical calculations and is found to agree with the dissociation energy of Si-H groups of about 3.25 eV per H atom, provided that the formation energy per dangling bond in ɑ-Si is about 1.15 eV. It is shown that this result is valid for ɑ-Si:H films, too
Format: application/pdf
ISSN: 1098-0121 (versió paper)
1550-235X (versió electrònica)
Document access: http://hdl.handle.net/10256/7696
Language: eng
Publisher: American Physical Society
Collection: Reproducció digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.65.115403
Articles publicats (D-F)
Is part of: © Physical Review B, 2002, vol. 65, num. 11, p. 115403-115407
Rights: Tots els drets reservats
Subject: Ciència dels materials
Materials science
Semiconductors amorfs
Amorphous semiconductors
Capes fines
Thin films
Materials nanoestructurals
Nanostructure materials
Title: Calorimetry of hydrogen desorption from ɑ-Si nanoparticles
Type: info:eu-repo/semantics/article
Repository: DUGiDocs

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