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Molecular hydrogen diffusion in nanostructured amorphous silicon thin films

We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data

漏 Physical Review B, 2009, vol. 80, n煤m. 7, p. 073202

American Physical Society

Author: Kail, Fatiha
Farjas Silva, Jordi
Roura Grabulosa, Pere
Date: 2009
Abstract: We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data
Format: application/pdf
ISSN: 1098-0121 (versi贸 paper)
1550-235X (versi贸 electr貌nica)
Document access: http://hdl.handle.net/10256/8575
Language: eng
Publisher: American Physical Society
Collection: Reproducci贸 digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.80.073202
Articles publicats (D-F)
Is part of: 漏 Physical Review B, 2009, vol. 80, n煤m. 7, p. 073202
Rights: Tots els drets reservats
Subject: Hidrogenaci贸
Hydrogenation
Silici
Silicon
Materials nanoestructurals
Nanostructure materials
Thin films
Capes fines
Title: Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
Type: info:eu-repo/semantics/article
Repository: DUGiDocs

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