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Molecular hydrogen diffusion in nanostructured amorphous silicon thin films

We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data

American Physical Society

Author: Kail, Fatiha
Farjas Silva, Jordi
Roura Grabulosa, Pere
Abstract: We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data
Document access: http://hdl.handle.net/2072/220000
Language: eng
Publisher: American Physical Society
Rights: Tots els drets reservats
Subject: Hidrogenació
Hydrogenation
Silici
Silicon
Materials nanoestructurals
Nanostructure materials
Thin films
Capes fines
Title: Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
Type: info:eu-repo/semantics/article
Repository: Recercat

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